TECHNICAL PROGRAM FOR IEEE IITC 2022
Monday, June 27, 2022
Workshop – Details coming soon.
Tuesday, June 28, 2022
Session 1: Conference kick-off / Awards Program
Session 2: 3D Integration and Advanced Packaging
Session 3: 3D Integration and Advanced Packaging 2
Session 4: Memory and Emerging Technologies
Wednesday, June 29, 2022
Session 5: Reliability
Session 6: Unit Process and Integration
Session 7: Unit Process and Integration
Session 8: Advanced Interconnects
Poster Session : Conference Reception
Thursday, June 30, 2022
Session 9: Advanced Interconnects
Session 10: DTCO
Session 11: DTCO and Unit Process and Integration
**All times in pacific standard time.
Tuesday, June 28, 2022
Session 1: Conference Kick-off and Awards Program
8:15 – 8:25
Welcome
Hui Jae Yoo – AMAT
8:25 – 8:35
Award Program – Best Papers 2021
8:35 – 9:25
Keynote – Directions, Challenges and Opportunities in Heterogeneous Integration
Ravi Mahajan – Intel
9:25 – 10:15
Keynote – EUV lithography: what’s up and what’s next
Anthony Yen – ASML
10:15 – 10:35 Coffee Break
Session 2: 3D Integration and Advanced Packaging
10:35 – 11:05
2.1 Heterogeneous Integration for AI Architectures
Invited – Mukta Farooq, IBM Research
11:05 – 11:35
2.2 Ponte Vecchio : Building a Foundation to Enable 1000X Scaling for the Third Dimension of Moore’s Law
Invited – Wilfred Gomes, Intel Corporation
11:35 – 12:00
2.3 Pixel Pitch Hybrid Bonding and Three Layer Stacking Technology for BSI Image Sensor
Kazumasa Tanida*, Shigeru Suzuki, Toshiki Seo, Yasunori Morinaga, Hayato Korogi, Michinari Tetani, Masakazu Hamada, Ryuji Eto, Takeshi Yamashita, Yasuhiro Kato, Naoaki Sato, Tadami Shimizu, Tetsuro Hanawa, Hiroko Kubo, Kenji Ueda, Fumitaka Ito, Yoshihiro Noguchi, Masayuki Nakamura, Ryuji Mizukoshi, Masahiko Takeuchi, Masakatsu Suzuki, Naoto Niisoe, Isao Miyanaga, Atsushi Ikeda, Susumu Matsumoto, Tower Partners Semiconductor
12:00 – 13:20 Lunch
Session 3: 3D Integration and Advanced Packaging
13:20 – 13:50
3.1 Cu Hybrid Bonding Process Key Challenges and Solutions to C2W and W2W Bonding Applications
Invited – Wei Zhou, Micron
13:50 – 14:20
3.2 Nanoengineered CTE Tailorable Copper Solder for Robust High Performance Heterogeneous Integration and Packaging
Invited – Alfred Zinn, Kuprion Inc
14:20 – 14:45
3.3 TSV fabrication technology using direct electroplating of Cu on the electroless plated barrier metal
Shoso Shingubara*, Tomohiro Shimizu, Kosuke matsui, yuko miyake, Yuichiro Torinari, Makoto Motoyoshi, Shigeru Watariguchi, Hideki Watanabe, Kansai Univ
14:45 – 15:05 pm Break
Session 4: Memory and Emerging Technologies
15:05 – 15:35
4.1 A Materials to Systems Understanding of a BEOL Embedded Analog NVM Memory Technology for Edge Compute Applications
Invited – Michael Chudzik, AMAT
15:35 – 16:05
4.2 Demonstration of HfO2-based BEOL-integrated ferroelectric memories: current status and future challenges
Invited – Laurent Grenouillet, CEA-Leti
16:05 – 16:35
4.3 Via-switch FPGA with Transistor-free Programmability
Invited – Masanori Hashimoto, Kyoto University
16:35 – 17:00
4.4 Carbon Plug Application in 3D NAND Fabrication
Yu Chih Chang, Liang-Yu Chen, Kuang-Wei Chen*, Tuung Luoh, Ling-Wuu Yang, Ta-Hone Yang, Kuang-Chao Chen, Macronix
17:00 – 17:25
4.5 Low Temperature 90nm Pitch Invertigations for BEOL Quantum Applications
Roselyne Segaud, Patrice Gergaud, Stephane Minoret, Paul Neuman, Frederic Gustavo, Agnes Royer, Christophe Licitra, Denis Mariol, Fatrice Nemouchi, CEA-Leti
Wednesday, June 29, 2022
Session 5: Reliability
8:15 – 8:40
5.1 Effects of composition deviation of CuAl2 on Electromigration
Toshihiro Kuge, Masataka Yahagi, Junichi KoikeToshihiro Kuge, Masataka Yahagi, Junichi Koike, Tohoku Univ
8:40 – 9:05
5.2 Dynamics of electromigration voids in Cu interconnects: investigation using a physics-based model augmented by neural networks
(Student) Ahmed S. Saleh, Houman Zahedmanesh, Hajdin Ceric, Kristof Croes, Ingrid De Wolf, IMEC
9:05 – 9:30
5.3 Reliability Evaluation of Semi-damascene Ru/Air-Gap interconnect with Metal Pitch down to 18 nm
Alicja Lesniewska, Olalla Varela Pedreira, Philippe Roussel, Giulio Marti, Ankit Pokhrel, Marleen H. van der Veen, Stefan Decoster, Martin O’Toole, Gayle Murdoch, Ivan Ciofi, Seongho Park, Zsolt kei, Kristof Croes, IMEC
9:30 – 9:55
5.4 Reliability benchmark of various via prefill metals
Olalla Varela Pedreira, Veerle Simons, Marleen H. van der Veen, Ivan Ciofi, Seongho Park, Zsolt Tokei, Kristof Croes, Shirish Pethe, Wei Lei, Shinjae Hwang, Zhiyuan Wu, Feng Chen, Alexander Jansen, Jerome Machillot, Andrew Cockburn, IMEC
9:55 – 10:20
5.5 Failure Mode Analysis in Microsecond UV Laser Annealing of Cu Thin Films
Remi Demoulin, Richard Daubriac, Louis Thuries, Emmanuel Scheid, Fabien Rozé, Fuccio Cristiano, Toshiyuki Tabata, Fulvio Mazzamuto, Laser Systems & Solutions of Europe (LASSE)
10:20 – 10:40 AM Break
Session 6: Unit Process and Integration
10:40 – 11:10
6.1 Recent Progress in Graphene Processes for Metallization and RF Applications
Invited – Kazuyoshi Ueno, Shibaura Institute of Technology
11:10 – 11:40
6.2 Advanced process technologies for continuous logic scaling towards 2nm node and beyond
Invited – Tomonari Yamamoto, Tokyo Electron Limited
11:40 – 12:05
6.3 Computational Analysis of the Role of Nanoconfinement on the Reliability of ULK Glasses
Karsu Kilic, Reinhold Dauskardt, Stanford
12:05 – 13:25 Lunch
Session 7: Unit Process and Integration
13:25 – 13:50
7.1 Improvement of Line-to-line TDDB by Cu and Barrier-metal Recess Structure for high voltage circuit in 3D Flash Memory
Mitsuhiko Noda, Kotaro Fujii, Naomi Yanai, Tsubasa Watanabe, Atsushi Kato, Kosuke Horibe, Eiru Yoshida, Tatsuhiko Koide, Hiroshi Fujita, Yumi Nakajima, Masayoshi Tagami, Kazuya Ohuchi, Kioxia
13:50 – 14:15
7.2 Enabling 3-level High Aspect Ratio Supervias for 3nm nodes and below
Daniel Montero, Victor Vega Gonzalez, Yannick Feurprier, Olalla Varela Pedreira, Noriaki Oikawa, GERARDO Martinez, Dmitry Batuk, Harinarayanan Puliyalil, Janko Versluijs, Hanne De Coster, Nina Bazzazian, Nicolas Jourdan, Kaushik Kumar, Frederic Lazzarino, Gayle Murdoch, Seongho Park, Zsolt Tokei, IMCE
14:15 – 14:40
7.3 Galvanic Corrosion Effect of Co Liner on ALD TaN Barrier
Junki Jang, Changhyun Kim, Youngsoo Yoon, Yun Ki Choi, Hoon Kim, Jungil Park, Jaehyeong Park, Minguk Kang, Youngwoo Kim, Seonguk Jang, Junghwan Ahn, Eunyoung Park, Wonmin Jeong, Jeongjae Kim, Minhyuk Oh, Wonkyu Han, Dongwoo Shin, Wookhwan Kim, Jaeyoung Yang, Honglae Park, Segab Kwon, Jeong Hoon Ahn, Dr. Ku, Jahum, Samsung
14:40 – 15:00 PM Break
Session 8: Advanced Interconnects
15:00 – 15:30
8.1 A Advanced interconnect technology for 2nm node and beyond
Invited – Jinnam Kimm, Samsung Electronics
15:30 – 15:55
8.2 Metal-Induced Line Width Variability Challenge and Mitigation Strategy in Advanced Post-Cu Interconnects
Koichi Motoyama, Nick Lanzillo, Sagarika Mukesh, Cornelius Brown Peethala, Terry Spooner, daniel edelstein, Kisik Choi, IBM
15:55 – 16:20
8.3 Barrierless ALD Molybdenum for Buried Power Rail and Via-to-Buried Power Rail metallization
Anshul Gupta, Jan Willem Maes, Nicolas Jourdan, Chiyu Zhu, Sukanya Datta, Olalla Varela Pedreira, Quoc Toan Le, Dunja Radisic, nancy heylen, Antoine Pacco, Shouhua Wang, Moataz Mousa, Young Byun, Felix Seidel, Bart de Wachter, Gayle Murdoch, Zsolt Tokei, Eugenio Dentoni Litta, Naoto Horiguchi, IMEC
16:20 – 16:45
8.4 MP18-26 Ru Direct-Etch Integration Development with Leakage Improvement and Increased Aspect Ratio
Ankit Pokhrel, Giulio Marti, Martin O’Toole, Gayle Murdoch, Anshul Gupta, Stefan Decoster, Souvik Kundu, Elisabeth Camerotto, Quoc Toan Le, Arame Thiam, Alicja Lesniewska, Seongho Park, Zsolt Tokei, IMEC
16:45 – 17:10
8.5 Balancing Interconnect Resistance and Capacitance at the Advanced Technology Nodes based on Full Chip Analysis
(Student) Da Eun Shim, Azad Naeemi, GIT
17:30 – 19:30
Poster Session – Conference Reception
Thursday, June 30, 2022
Session 9: Advanced Interconnects
8:15 – 8:45
9.1 Recent Advances in Ni-based GeSn Metallization
Invited – Philippe Rodriguez, CEA-Leti
8:45 – 9:15
9.2 ALD of Ru with bulk-like resistivity by balancing precursor concentration to maximum surface mobility and minimize contaminants
Invited – Andy Kummel, UCSD
9:15 – 9:40
9.3 Capacitive Impacts of Etch-Induced Dielectric Damage in Highly-Scaled Interconnect Architectures
Janet M Wilson, Nick Lanzillo, IBM
9:40 – 10:05
9.4 Performance improvement for Cu interconnects by SAM and ELD technologies
Yuki Kikuchi, Tokyo Electron Limited
10:05 – 10:30
9.5 Low Resistance Cu Vias for 24nm Pitch and Beyond
Marleen H. van der Veen, Olalla Varela Pedreira, Nicolas Jourdan, Seongho Park, Herbert Struyf, Zsolt Tokei, Carmen Leal Cervantes, Feng Chen, Xiangjin Xie, Zhiyuan Wu, Alexander Jansen, Jerome Machillot, Andrew Cockburn, IMEC
10:30 – 10:50 AM Break
Session 10: DTCO
10:50 – 11:20
10.1 Design-Technology Co-Optimization for BEOL Interconnect in Advanced Technologies
Invited – Pieter Woltgens, ASML
11:20 – 11:45
10.2 EUV Minimum Pitch Single Patterning for 5nm Node Manufacturing
Jungil Park, Yun Ki Choi, Jeong Hoon Ahn, Byung Je Jung, Hoyoun Lee, Jinho Kim, Eunyoung Park, Jaehyeong Park, Hyun-Ji Song, Miji Lee, Dr. Ku, Jahum, Samsung
11:45 – 12:10
10.3 Evaluation of BEOL scaling boosters for sub-2nm using enhanced-RO analysis
Anita Farokhnejad, Simone Esposto, Ivan Ciofi, Odysseas Zografos, Pieter Weckx, Julien Ryckaert, Pieter Schuddinck, Yang Xiang, Zsolt Tokei, IMEC
12:10 – 13:30 Lunch
Session 11: DTCO and Unit Process and Integration
13:30 – 13:55
11.1 Cryogenic CMOS Performance Analysis Including BEOL Characteristics at 4K for Quantum Controller Application
Koichiro Okamoto, Takahisa Tanaka, Makoto Miyamura, Hiroki Ishikuro, Ken Uchida, Toshitsugu Sakamoto, Munehiro Tada (Recording), NanoBridge Semiconductor
13:55 – 14:20
11.2 Dual Damascene 28nm-Pitch Single Exposure EUV Design Rules Evaluation by Voltage Contrast Characterization
Victor M. Carballo, Dorin Cerbu, Filip Schleicher, Jeroen van de kerkhove, Philippe Leray, Nicola Kissoon, Etienne De Poortere, IMCE
14:20 – 14:50
11.3 Death No Moore: EUV Dry Resist for Continuous Scaling of Semiconductor Devices
Invited – Qinghuang Lin, Lam Research
14:50 – 15:20
11.4 Unit Process Trends and Challenges for Advanced Interconnect Scaling
Invited – Andy Simon, IBM Research
15:20 – 15:45
11.5 ALD Mo for Advanced MOL Local Interconnects
Maryamsadat Hosseini, Davide Tierno, Jan Willem Maes, Chiyu Zhu, Sukanya Datta, Young Byun, Moataz Mousa, Nicolas Jourdan, Eugenio Dentoni Litta, Naoto Horiguchi, IMEC
15:45 – 16:10
11.6 Low Resistivity Tungsten and Ruthenium through Textural Control Using Ion Beam Deposition
Rutvik Mehta, Frank Cerio, Yuejing (Crystal) Wang, Paul Turner, Jinho Kim, Ashish Kulkarni, Mohammad Saghayezhian, Robert Caldwell, VEECO