Keynote Speaker 2 – Anthony Yen
EUV lithography: what’s up and what’s next
Nanolithography enables today’s intelligent society and extreme-ultraviolet (EUV) lithography is the latest enabling lithographic technology. ASML’s EUV exposure systems are being used in the high-volume production of semiconductor logic and memory chips. In the words of Professor Jesús del Alamo of MIT, “It’s an absolutely revolutionary product, a breakthrough that is going to give a new lease of life to the industry for years.” For this presentation, I will start with a brief history of the development of EUV lithography and then present the technology’s present status, including its use in the manufacture of logic integrated circuits. Finally, I will give a progress report on our next-generation EUV exposure systems and an outlook of EUV lithography for the remainder of this decade.
Anthony Yen is Vice President and Head of Technology Development Center at ASML, responsible for providing the company with mid- and long-term technology directions and working with customers, peers, universities, and R&D organization IMEC to develop enabling technologies. Prior to joining ASML, he headed Nanopatterning Technology Infrastructure Division at TSMC and played a key role in bringing EUV lithography, including its mask technology, to high-volume production. He received his undergraduate degree from Purdue University and his master’s, engineer’s, doctoral, and MBA degrees from MIT. He is a fellow of the IEEE and SPIE, and was awarded Outstanding Electrical and Computer Engineer by Purdue’s School of Electrical and Computer Engineering.